A process for the combined fabrication of ion sensors and CMOS circuits

Development of an Ion-Sensitive Solid-State Device for Neurophysiological Measurements

1970 • 1,982 citations

Methods of isfet fabrication

1981 • 335 citations

Ion-sensing devices with silicon nitride and borosilicate glass insulators

1987 • 218 citations

A miniature flow-through cell with a four-function chemfet integrated circuit for simultaneous measurements of potassium, hydrogen, calcium and sodium ions

1984 • 118 citations

Properties of low-pressure CVD tungsten silicide for MOS VLSI interconnections

1983 • 113 citations

Hydrogen, Calcium, and Potassium Ion-Sensitive FET Transducers: A Preliminary Report

1978 • 84 citations

Implantable sensors for closed-loop prosthetic systems

1985 • 52 citations

Structure of the double layer at the oxide/water interface

1973 • 47 citations

A chemical-sensitive integrated-circuit: the operational transducer

1985 • 40 citations

Dopant redistribution during titanium silicide formation

1986 • 34 citations

Chemical-sensitive field-effect transistors

1983 • 33 citations

Interaction Between CVD Tungsten Films and Silicon during Annealing

1986 • 14 citations

Characterization of transient process phenomena using a temperature-tolerant metallurgy

1984 • 4 citations

C-MOS Compatible pH-ISFET with Al2O3 Gate in Implantable Sensors for Closed-Loop Prosthetic Systems

1985 • 3 citations