Interaction Between CVD Tungsten Films and Silicon during Annealing

T. I. Kamins, S. S. Laderman, D. Coulman, J. E. Turner

DOI: 10.1149/1.2108930

Journal of The Electrochemical Society

Data up to Jan 2025

Published1986

Citations14

References0

Fields

Materials science Chemistry Metallurgy Composite material Crystallography

Total Citations Per Year

Abstract

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Interaction Between CVD Tungsten Films and Silicon during Annealing (1986) – Journal of The Electrochemical Society | Metascience Observatory Explorer