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Interface effects in the formation of silicon oxide on metal silicide layers over silicon substrates

Data up to Jan 2025

Published1983
Citations46
References29

Total Citations Per Year

Abstract

References (29)

General Relationship for the Thermal Oxidation of Silicon

1965 • 3,245 citations

Physics and technology of semiconductor devices

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1 µm MOSFET VLSI technology: Part VII—Metal silicide interconnection technology—A future perspective

1979 • 167 citations

Diffusion in intermetallic compounds with the CaF2 structure: A marker study of the formation of NiSi2 thin films

1982 • 126 citations

Formation of iridium silicides from Ir thin films on Si substrates

1979 • 124 citations

Oxidation mechanisms in WSi2 thin films

1978 • 119 citations

Reaction kinetics of tungsten thin films on silicon (100) surfaces

1973 • 92 citations

Reaction kinetics of molybdenum thin films on silicon (111) surface

1978 • 85 citations

Oxidation of silicide thin films: TiSi2

1983 • 76 citations

The formation of silicides in Mo-W Bilayer films on si substrates: A marker experiment

1979 • 75 citations

Kinetics of the thermal oxidation of WSi2

1979 • 68 citations

Properties of tungsten silicide film on polycrystalline silicon

1981 • 67 citations

An alternative marker experiment in the formation of Mo and W silicides

1978 • 62 citations

Silicon Oxidation Studies: The Oxidation of Heavily B‐ and P‐Doped Single Crystal Silicon

1978 • 62 citations

An interface — marker technique applied to the study of metal silicide growth

1980 • 61 citations

Oxidation of tantalum disilicide on polycrystalline silicon

1980 • 57 citations

A Xe marker study of the transformation of Ni2Si to NiSi in thin films

1981 • 57 citations

The thin-film formation of rhodium silicides

1980 • 56 citations

Characterization of Thin Film Molybdenum Silicide Oxide

1980 • 54 citations

Thermal oxidation of hafnium silicide films on silicon

1980 • 54 citations

Thermal oxidation of nickel disilicide

1982 • 48 citations

Oxidation mechanisms in TiSi2 films on single silicon substrates

1980 • 46 citations

IrSi1.75 a new semiconductor compound

1982 • 43 citations

Radioactive Ni∗ tracer study of the nickel silicide growth mechanism

1982 • 43 citations

Studies of the Growth and Oxidation of Metal‐Silicides Using Radioactive 31Si as Tracer

1981 • 37 citations

Oxidation of sputtered molybdenum silicide thin films

1978 • 32 citations

Investigation on TiSi2 thin-film oxidation by radioactive tracer technique

1982 • 30 citations

Studies of steam-oxidized WSi2 by Auger sputter profiling

1980 • 14 citations

Investigation of the oxidation properties of cw laser formed WSi2

1982 • 14 citations

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