Oxidation of tantalum disilicide on polycrystalline silicon

Physics and technology of semiconductor devices

1967 • 2,850 citations

Thin film interaction between titanium and polycrystalline silicon

1980 • 189 citations

High-Temperature Materials and Technology

1968 • 150 citations

Silicide formation in thin cosputtered (titanium + silicon) films on polycrystalline silicon and SiO2.

1980 • 131 citations

Oxidation mechanisms in WSi2 thin films

1978 • 119 citations

A New MOS Process Using MoSi₂as a Gate Material

1978 • 65 citations

Silicide formation in thin cosputtered (tantalum + silicon) films on polycrystalline silicon and SiO2

1980 • 51 citations

The Oxidation of Sputtered Tantalum Films and Its Relationship to the Stability of the Electrical Resistance of These Films

1961 • 9 citations

Reaction of flowing steam with the refractory metals niobium and tantalum

1965 • 8 citations