Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching

Positive-ion bombardment of substrates in rf diode glow discharge sputtering

1972 • 420 citations

Electron-beam fabrication of 80-Å metal structures

1976 • 305 citations

The etching of silicon with XeF2 vapor

1979 • 294 citations

Ion-surface interactions in plasma etching

1977 • 215 citations

Electron-irradiation effect in the Auger analysis of SiO2

1974 • 197 citations

Control of relative etch rates of SiO2 and Si in plasma etching

1975 • 185 citations

Glow Discharge Phenomena in Plasma Etching and Plasma Deposition

1979 • 152 citations

A study of the charging and dissociation of SiO2 Surfaces by AES

1977 • 139 citations

The role of chemisorption in plasma etching

1978 • 130 citations

Profile control by reactive sputter etching

1978 • 126 citations

Chlorine chemisorption on silicon and germanium surfaces: Photoemission polarization effects with synchrotron radiation

1977 • 124 citations

Electron stimulated oxidation of GaAs, studied by quantitative auger electron spectroscopy

1975 • 124 citations

RF Sputter-Etching by Fluoro-Chloro-Hydrocarbon Gases

1974 • 98 citations

Mechanism of silicon etching by a CF4 plasma

1978 • 95 citations

Argon ion etching in a reactive gas

1973 • 86 citations

Reactive ion etching of aluminum and aluminum alloys in an rf plasma containing halogen species

1978 • 82 citations

Some characteristics and uses of low‐pressure plasmas in materials science

1977 • 81 citations

Surface Cleaning by Cathode Sputtering

1960 • 79 citations

Chemisorption of chlorine on Si(111) 7 × 7 and 1 × 1 surfaces

1977 • 64 citations

The chemical sputtering of graphite in an oxygen plasma

1976 • 49 citations

Contamination formed around a very narrow electron beam

1976 • 37 citations

The interference of an electron beam with the surface reaction between oxygen and germanium

1975 • 36 citations

The electron stimulated interaction of H2O with a nickel surface

1977 • 29 citations

The influence of an electron beam on oxidation of polycrystalline nickel surfaces, monitored by disappearance potential spectroscopy (DAPS)

1976 • 28 citations

Electron-stimulated processes at solid surfaces

1976 • 23 citations

The monomeric character of xenon hexafluoride vapor. The mass spectroscopy of noble gas binary fluorides and xenon oxide tetrafluoride

1977 • 22 citations

Kinetics of Reaction of Elemental Fluorine. III. Fluorination of Silicon and Boron¹

1964 • 20 citations

rf Sputtering of graphite in argon-oxygen mixtures

1976 • 15 citations

AES study of electron-beam-induced interactions between oxygen and the Ge(111) surface

1976 • 15 citations

CONTAMINATION AND IRRADIATION EFFECTS AND THEIR DEPENDENCE ON THE COMPOSITION OF RESIDUAL GASES IN THE ELECTRON MICROSCOPE.

1965 • 15 citations

Some comments on electron-beam-induced adsorption

1977 • 13 citations