Mechanism of silicon etching by a CF4 plasma

J. L. Mauer, J. S. Logan, L. B. Zielinski, G. C. Schwartz

DOI: 10.1116/1.569836

Journal of Vacuum Science and Technology

Data up to Jan 2025

Published1978

Citations95

References0

Fields

Materials science Chemistry Physics Composite material Nanotechnology Metallurgy

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