Ion-surface interactions in plasma etching

Chemistry and Technology of Silicones

1968 • 884 citations

Techniques and Applications of Plasma Chemistry

1974 • 775 citations

Positive-ion bombardment of substrates in rf diode glow discharge sputtering

1972 • 420 citations

Control of relative etch rates of SiO2 and Si in plasma etching

1975 • 185 citations

A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

1977 • 149 citations

The kinetic isotope effect in the dissociative chemisorption of methane

1976 • 122 citations

Plasma etching in integrated circuit manufacture—A review

1977 • 120 citations

RF Sputter-Etching by Fluoro-Chloro-Hydrocarbon Gases

1974 • 98 citations

Dry process technology (reactive ion etching)

1976 • 97 citations

Introduction to ion and plasma etching

1976 • 83 citations

The chemisorption of nitrogen at activated sites on a polycrystalline tungsten surface

1971 • 71 citations

Progress in monitoring thin film thickness with quartz crystal resonators

1976 • 55 citations

A New Chemical Dry Etching

1976 • 53 citations

Reactive plasma cleaning of metals

1977 • 36 citations

A mass spectrometric study of the neutral and positive ionic species involved in carbon deposition from r.f. discharges in carbon containing gases

1968 • 9 citations

Patterning of Metal Films by Gas Plasma Technique

1975 • 6 citations

Scanning Electron Induced Desorption Study of Surface Fluorine Migration

1974 • 5 citations