Carbon tetrachloride plasma etching of GaAs and InP: A kinetic study utilizing nonperturbative optical techniques

CRC Handbook of Chemistry and Physics

2014 • 56,288 citations

Comprehensive Inorganic Chemistry

1973 • 3,014 citations

The identification of molecular spectra

1951 • 2,326 citations

High-Resolution Laser Spectroscopy

1976 • 397 citations

The reaction of fluorine atoms with silicon

1981 • 322 citations

The evaporation of GaAs under equilibrium and non-equilibrium conditions using a modulated beam technique

1973 • 263 citations

The Loading Effect in Plasma Etching

1977 • 217 citations

The evaporation of InP under Knudsen (equilibrium) and Langmuir (free) evaporation conditions

1974 • 161 citations

Monolithic two-section GaInAsP/InP active-optical-resonator devices formed by reactive ion etching

1981 • 138 citations

GaInAsP/InP stripe-geometry laser with a reactive-ion-etched facet

1980 • 103 citations

Reactive-ion etching of GaAs and InP using CCl2F2/Ar/O2

1980 • 99 citations

Matrix‐Isolation Study of the Reaction of Carbon Atoms with Chlorine. The Electronic and Vibrational Spectra of the Free Radical CCl2

1967 • 95 citations

Dissociative Electron Attachment to CCl₄, CHCl₃, CH₂Cl₂ and CH₃Cl

1980 • 85 citations

Reactive ion etching of aluminum and aluminum alloys in an rf plasma containing halogen species

1978 • 82 citations

Comparison of Aluminum Etch Rates in Carbon Tetrachloride and Boron Trichloride Plasmas

1981 • 77 citations

The compositional and structural changes that accompany the thermal annealing of (100) surfaces of GaAs, InP and GaP in vacuum

1976 • 76 citations

Plasma etching of III–V compound semiconductor materials and their oxides

1981 • 69 citations

Mechanisms of radical production in CF3Cl, CF3Br, and related plasma etching gases: The role of added oxidants

1981 • 60 citations

Laser induced fluorescence of CFCl and CCl2 in the gas phase

1977 • 60 citations

Reactive ion beam etching of InP with Cl2

1981 • 56 citations

Surface composition and etching of III-V semiconductors in Cl2 ion beams

1982 • 52 citations

Emission and excitation spectra of CCl2 in solid argon

1977 • 50 citations

Laser-induced fluorescence spectrum of argon matrix-isolated dichlorocarbene

1975 • 46 citations

Laser-induced fluorescence excitation spectra of CCl2 and CFCI radicals in the gas phase

1979 • 44 citations

Mass-spectrometric sampling of the ionic and neutral species present in different regions of an RF discharge in methane

1975 • 44 citations

Optical Pumping: An Introduction

1967 • 44 citations

CCl4 and Cl2 Plasma Etching of III–V Semiconductors and the Role of Added O 2

1982 • 40 citations

Aluminum Etching in Carbon Tetrachloride Plasmas

1980 • 37 citations

End Point Determination of Aluminum CCl4 Plasma Etching by Optical Emission Spectroscopy

1978 • 34 citations

Preferential lateral chemical etching in reactive ion etching of aluminum and aluminum alloys

1979 • 25 citations

Plasma separation of InGaAsP/InP light-emitting diodes

1980 • 20 citations

Electron chemistry. Chemical reactions in CCl4, CFCl3 and CF2Cl2 induced by low-energy electrons

1980 • 12 citations

Detection of the neutral fragments produced in an electron impact ion source

1969 • 6 citations

Evaluation of Ultrathin Native Oxide on GaAs Surface

1980 • 4 citations