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Plasma etching of III–V compound semiconductor materials and their oxides

G. Smolinsky, R. P. H. Chang, T. M. Mayer
DOI: 10.1116/1.570690
Journal of Vacuum Science and Technology

Data up to Jan 2025

Published1981
Citations69
References0
Fields
ChemistryMaterials sciencePhysicsInorganic chemistryNanotechnologyPhysical chemistry

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Plasma etching of III–V compound semiconductor materials and their oxides (1981) – Journal of Vacuum Science and Technology | Metascience Observatory Explorer