The reaction of fluorine atoms with silicon

Thin Film Processes

1979 • 902 citations

Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching

1979 • 696 citations

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas

1978 • 533 citations

Electron spectroscopy study of silicon surfaces exposed to XeF2 and the chemisorption of SiF4 on silicon

1980 • 171 citations

Silicon-Fluorine Chemistry. I. Silicon Difluoride and the Perfluorosilanes¹

1965 • 149 citations

Reaction of fluorine atoms with SiO2

1979 • 95 citations

The plasma oxidation of CF4 in a tubular-alumina fast-flow reactor

1979 • 94 citations

Studies of chemiluminescence accompanying fluorine atom etching of silicon

1980 • 70 citations

Theory of Atomic Recombination on Surfaces

1971 • 35 citations

Chemisorption and incorporation of oxygen at a nickel surface

1967 • 28 citations

Etching Silicon with Fluorine Gas

1979 • 26 citations

The adsorption of CO on planar and oxygen-etched silicon surfaces

1978 • 24 citations

Infrared Chemiluminescence from Xe<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">F</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>-Silicon-Surface Reactions

1979 • 22 citations

Kinetics of Reaction of Elemental Fluorine. III. Fluorination of Silicon and Boron¹

1964 • 20 citations

Double-pulse excitation experiments on the Ca+ cyclic laser

1979 • 3 citations