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Abstract

References (21)

General Relationship for the Thermal Oxidation of Silicon

1965 • 3,245 citations

Thermal Oxidation of Silicon in Dry Oxygen Growth‐Rate Enhancement in the Thin Regime: I . Experimental Results

1985 • 306 citations

Stress in thermal SiO2 during growth

1979 • 274 citations

The Oxidation of Shaped Silicon Surfaces

1982 • 254 citations

Formation of Silicon Nitride at a Si ‐ SiO2 Interface during Local Oxidation of Silicon and during Heat‐Treatment of Oxidized Silicon in NH 3 Gas

1976 • 134 citations

Oxidation induced stresses and some effects on the behavior of oxide films

1983 • 128 citations

Dry oxidation of silicon: A new model of growth including relaxation of stress by viscous flow

1983 • 105 citations

Thermal Oxidation of Heavily Doped Silicon

1965 • 101 citations

Two-dimensional oxidation

1983 • 74 citations

Residual Stress, Chemical Etch Rate, Refractive Index, and Density Measurements on SiO2 Films Prepared Using High Pressure Oxygen

1980 • 57 citations

Polysilicon / SiO2 Interface Microtexture and Dielectric Breakdown

1982 • 43 citations

Thermal oxidation of silicon in dry oxygen

1983 • 43 citations

The Use of the Scanning Electron Microscope

1973 • 39 citations

Numerical modeling of nonuniform Si thermal oxidation

1985 • 35 citations

Two-dimensional silicon oxidation experiments and theory

1985 • 33 citations

Numerical Simulation of Gate Oxide Thinning in MOS Devices

1982 • 22 citations

Gate Oxide Thinning at the Isolation Oxide Wall

1978 • 22 citations

Transmission electron microscopy studies of the polycrystalline silicon-SiO2 interface

1983 • 19 citations

A study of trenched capacitor structures

1985 • 15 citations

Two Dimensional Effect on Suppression of Thermal Oxidation Rate

1984 • 11 citations

IIB-1 the role of stress in two-dimensional silicon oxidation

1985 • 5 citations

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