A Study of the Optical Emission from an rf Plasma during Semiconductor Etching
Data up to Jan 2025
Total Citations Per Year
Abstract
References (11)
The identification of molecular spectra
1964 • 503 citations
On the Emission Bands of C<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">F</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>
1950 • 109 citations
Dry process technology (reactive ion etching)
1976 • 97 citations
Emission spectrum of CF
1965 • 91 citations
Spectroscopic Study of Radiofrequency Oxygen Plasma Stripping of Negative Photoresists. I. Ultraviolet Spectrum
1976 • 57 citations
Ionic and neutral products of an RF discharge in methane
1975 • 53 citations
A New Chemical Dry Etching
1976 • 53 citations
Relative rate constants for the reaction of O(1D) atoms with fluorocarbons and N2O
1974 • 46 citations
Reaction of O(2 1D2) atoms with chlorofluoromethanes: Formation of ClO
1976 • 21 citations
Simple Optical Devices for Detection of Radiofrequency Oxygen Plasma Stripping of Photoresists
1977 • 18 citations
�ber die Bogenspektren von Fluor und Kalium
1936 • 11 citations