Electron-Beam Resists for Lift-Off Processing with Potential Application to Josephson Integrated Circuits

Single-Step Optical Lift-Off Process

1980 • 210 citations

Electron Resists for Microcircuit and Mask Production

1969 • 194 citations

Josephson Tunneling Barriers by rf Sputter Etching in an Oxygen Plasma

1971 • 145 citations

A High-Yield Photolithographic Technique for Surface Wave Devices

1971 • 74 citations

Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists

1979 • 72 citations

PMMA copolymers as high sensitivity electron resists

1979 • 58 citations

Stencil technique for the preparation of thin-film Josephson devices

1978 • 50 citations

A simple high-performance current-switched Josephson gate

1979 • 49 citations

Speed enhancement of PMMA resist

1979 • 40 citations

Performance characteristics of diazo-type photoresists under e-beam and optical exposure

1978 • 37 citations

1 µm MOSFET VLSI technology: Part VI—Electron-beam lithography

1979 • 35 citations

Electron-beam lithography using vector-scan techniques

1975 • 34 citations

Corrections to proximity effects in electron beam lithograhy. III. Experiments

1979 • 26 citations

Properties of superconducting weak links prepared by ion implantation and by electron beam lithography

1977 • 20 citations

Masking of deposited thin films by means of an aluminum-photoresist composite

1974 • 20 citations

Strain relaxation in Pb-alloy Josephson junction electrode materials

1979 • 17 citations

Printed and Integrated Circuitry

1964 • 9 citations

A current-switched full adder fabricated by photolithographic techniques

1978 • 5 citations

All-refractory weak-link SQUIDs for use in Josephson logic and memory applications

1979 • 3 citations