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Thin Films Deposited by Bias Sputtering
Data up to Jan 2025
Published1965
Citations167
References9
Total Citations Per Year
Abstract
References (9)
Basic Processes of Gaseous Electronics
1956 • 626 citations
Sputtering Yields at Very Low Bombarding Ion Energies
1962 • 296 citations
Effects of Nitrogen, Methane, and Oxygen on Structure and Electrical Properties of Thin Tantalum Films
1964 • 178 citations
Tantalum and Niobium
1960 • 152 citations
The adhesion of evaporated metal films on glass
1961 • 123 citations
Superconductive Films Made by Protected Sputtering of Tantalum or Niobium
1962 • 51 citations
Time-of-Flight Method of Determining Velocities of Sputtered Atoms
1963 • 22 citations
Properties of Thin Antimony Films Deposited in High Vacuum
1961 • 20 citations
Techniques for sputtering single and multilayer films of uniform resistivity
1963 • 11 citations
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