Back to search

Reactive ion etching of silicon

G. C. Schwartz, Philipp Schaible
DOI: 10.1116/1.569962
Journal of Vacuum Science and Technology

Data up to Jan 2025

Published1979
Citations110
References0
Fields
Materials scienceChemistryPhysicsGeologyOptoelectronicsNanotechnologyComposite material

Total Citations Per Year

Abstract

References (0)

No references found

Cited By (0)

Loading...
Reactive ion etching of silicon (1979) – Journal of Vacuum Science and Technology | Metascience Observatory Explorer