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A novel anisotropic dry etching technique

M. W. Geis, G. A. Lincoln, N. N. Efremow, W.J. Piacentini
DOI: 10.1116/1.571216
Journal of Vacuum Science and Technology

Data up to Jan 2025

Published1981
Citations117
References0
Fields
ChemistryMaterials sciencePhysicsOptoelectronicsNanotechnologyOptics

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