<title>Step and flash imprint lithography for sub-100-nm patterning</title>

Matthew Colburn, Annette Grot, Marie N. Amistoso, Byung Jin Choi, Todd Bailey

DOI: 10.1117/12.390082

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Data up to Jan 2025

Published2000

Citations76

References2

Fields

Materials science Physics Geology Optoelectronics Nanotechnology Optics

Total Citations Per Year

Abstract

References (2)

Mold-assisted nanolithography: A process for reliable pattern replication

1996 • 639 citations

Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

1999 • 150 citations

Cited By (0)

Loading...

<title>Step and flash imprint lithography for sub-100-nm patterning</title> (2000) – Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE | Metascience Observatory Explorer