Initial stage of room-temperature metal-silicide formation studied by high-energy<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mi mathvariant="normal">He</mml:mi></mml:mrow><mml:mrow><mml:mo>+</mml:mo></mml:mrow></mml:msup></mml:mrow></mml:math>-ion scattering
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Abstract
References (13)
First phase nucleation in silicon–transition-metal planar interfaces
1976 • 500 citations
Review of binary alloy formation by thin film interactions
1979 • 256 citations
Selective growth of metal-rich silicide of near-noble metals
1975 • 249 citations
Direct observation of the nucleation and growth modes of Ag/Si(111)
1980 • 168 citations
Microscopic Compound Formation at the Pd-Si(111) Interface
1979 • 120 citations
Structure and electrical characteristics of epitaxial palladium silicide contacts on single crystal silicon and diffused P-N diodes
1972 • 117 citations
LEED-AES study of the AuSi(100) system
1979 • 112 citations
AES study of the very first stages of condensation of gold films on silicon (111) surfaces
1977 • 107 citations
A Model on the Mechanism of Room Temperature Interfacial Intermixing Reaction in Various Metal‐Semiconductor Couples: What Triggers the Reaction?
1980 • 101 citations
Lattice Location by Channeling Angular Distributions: Bi Implanted in Si
1972 • 88 citations
Structure study of Au–Si interface by MeV ion scattering
1981 • 64 citations
Surface science: recent progress and perspectives
1975 • 55 citations
Chemical and structural properties of the Pd/Si interface during the initial stages of silicide formation
1979 • 55 citations