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Plasma-assisted etching mechanisms: The implications of reaction probability and halogen coverage

Harold F. Winters, J. W. Coburn
DOI: 10.1116/1.582996
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Data up to Jan 2025

Published1985
Citations109
References0
Fields
Materials scienceChemistryPhysicsAtomic physicsNanotechnologyMetallurgy

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Plasma-assisted etching mechanisms: The implications of reaction probability and halogen… (1985) – Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena | Metascience Observatory Explorer