Computer simulation of atomic mixing during ion bombardment

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

1969 • 3,398 citations

スパッタの理論 I 非晶質のスパッタ収量と多結晶ターゲット

1969 • 1,970 citations

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

1969 • 776 citations

Surface investigation of solids by the statical method of secondary ion mass spectroscopy (SIMS)

1973 • 440 citations

ON THE NUMBER OF ATOMS DISPLACED BY IMPLANTED IONS OR ENERGETIC RECOIL ATOMS

1969 • 343 citations

Heavy-ion range profiles and associated damage distributions

1972 • 191 citations

Spatial distribution of energy deposited into atomic processes in ion-implanted silicon

1970 • 139 citations

Computer Simulation of Sputtering

1968 • 127 citations

RANGE OF Xe¹³³ AND Ar⁴¹ IONS OF KEV ENERGIES IN TUNGSTEN

1963 • 96 citations

Monte Carlo Simulations on Scattering of Bombarded Ions in Solids

1972 • 84 citations

THE RANGE OF Na²⁴ IONS OF KILOELECTRON VOLT ENERGIES IN ALUMINUM

1961 • 59 citations

Secondary ion mass analysis, Technique for three-dimensional characterization

1972 • 53 citations

Computer simulation of knock-on effect under ion bombardment

1974 • 49 citations

Investigation of surface layers by SIMS and SIIMS

1973 • 47 citations

Spatial Distribution of Energy Deposited by Energetic Heavy Ions in Semiconductors

1971 • 41 citations

Monte Carlo simulation on the behavior of energetic ions in polyatomic targets

1972 • 24 citations