Sub-10 nm imprint lithography and applications

Imprint of sub-25 nm vias and trenches in polymers

1995 • 2,637 citations

Imprint Lithography with 25-Nanometer Resolution

1996 • 2,208 citations

Nanoscale patterning and oxidation of H-passivated Si(100)-2×1 surfaces with an ultrahigh vacuum scanning tunneling microscope

1994 • 476 citations

Imprint lithography with sub-10 nm feature size and high throughput

1997 • 371 citations

Imaging and modification of polymers by scanning tunneling and atomic force microscopy

1988 • 167 citations

Nanoscale silicon field effect transistors fabricated using imprint lithography

1997 • 140 citations

250-Å linewidths with PMMA electron resist

1978 • 136 citations

Nanoscale replication for scanning probe data storage

1996 • 92 citations

Replication of 175-Å lines and spaces in polymethylmethacrylate using x-ray lithography

1980 • 71 citations

Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm

1990 • 69 citations

Single electron and hole quantum dot transistors operating above 110 K

1995 • 25 citations