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The effects of stress on the formation of titanium silicide

Soofin Cheng, Hsiao‐Yu Huang, Yin-Wei Peng, L.J. Chen, C. J. Tsai
DOI: 10.1109/iitc.1998.704788

Data up to Jan 2025

Published2002
Citations1
References6
Fields
Materials sciencePhilosophyPhysicsGeologyComposite materialMetallurgyLinguistics

Total Citations Per Year

Abstract

References (6)

Metallization: theory and practice for VLSI and ULSI

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Thermal stability of TiSi2 on mono- and polycrystalline silicon

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Epitaxial growth of NiSi2 on (111)Si inside 0.1–0.6 μm oxide openings prepared by electron beam lithography

1996 • 40 citations

Epitaxial growth of CoSi2 on (111)Si inside miniature-size oxide openings by rapid thermal annealing

1991 • 21 citations

Cross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gate

1986 • 17 citations

Cited By (0)

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